메뉴 건너뛰기




Volumn 39, Issue 7, 2000, Pages 1094-1105

Fabrication and testing of chemically micromachined silicon echelle gratings

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MICROMACHINING; PATTERN MATCHING; PHOTOLITHOGRAPHY; SILICON WAFERS; SPECTROGRAPHS;

EID: 0000016685     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.001094     Document Type: Article
Times cited : (42)

References (25)
  • 1
    • 0001468726 scopus 로고
    • The production of diffraction gratings:The design of echelle gratings and spectrographs
    • G. R. Harrison, “The production of diffraction gratings: the design of echelle gratings and spectrographs, ” J. Opt. Soc. Am. 39, 522-528 (1949).
    • (1949) J. Opt. Soc. Am. , vol.39 , pp. 522-528
    • Harrison, G.R.1
  • 4
    • 0004115366 scopus 로고
    • Academic, San Diego, Calif
    • D. J. Schroeder, Astronomical Optics (Academic, San Diego, Calif., 1987), pp. 284-294.
    • (1987) Astronomical Optics , pp. 284-294
    • Schroeder, D.J.1
  • 5
    • 0016510124 scopus 로고
    • Preferentially etched diffraction gratings in silicon
    • W. Tsang and S. Wang, “Preferentially etched diffraction gratings in silicon, ” J. Appl. Phys. 46, 2163-2166 (1975).
    • (1975) J. Appl. Phys. , vol.46 , pp. 2163-2166
    • Tsang, W.1    Wang, S.2
  • 6
    • 0018983626 scopus 로고
    • Optical demultiplexer using a silicon echelette grating
    • Y. Fujii, “Optical demultiplexer using a silicon echelette grating, ” IEEE J. Quantum Electron. QE-16, 165-169 (1980).
    • (1980) IEEE J. Quantum Electron. QE-16 , pp. 165-169
    • Fujii, Y.1
  • 7
    • 0038644634 scopus 로고
    • Integrated fabrication of micromachined structures in silicon
    • R. A. Levy, ed, Kluwer Academic, Dordrecht, The Netherlands
    • J. C. Greenwood, “Integrated fabrication of micromachined structures in silicon, ” in Novel Silicon Based Technologies, R. A. Levy, ed. (Kluwer Academic, Dordrecht, The Netherlands, 1991), pp. 123-141.
    • (1991) Novel Silicon Based Technologies , pp. 123-141
    • Greenwood, J.C.1
  • 9
    • 0000583198 scopus 로고
    • Immersion grating for infrared astronomy
    • G. Wiedemann and D. E. Jennings, “Immersion grating for infrared astronomy, ” Appl. Opt. 32, 1176-1178 (1993).
    • (1993) Appl. Opt. , vol.32 , pp. 1176-1178
    • Wiedemann, G.1    Jennings, D.E.2
  • 11
    • 60949108539 scopus 로고    scopus 로고
    • Improving the optical performance of etched silicon gratings
    • A. M. Fowler, ed., Proc. SPIE
    • P. J. Kuzmenko and D. R. Ciarlo, “Improving the optical performance of etched silicon gratings, ” in Infrared Astronomical Instrumentation, A. M. Fowler, ed., Proc. SPIE 3354, 357-367 (1998).
    • (1998) Infrared Astronomical Instrumentation , vol.3354 , pp. 357-367
    • Kuzmenko, P.J.1    Ciarlo, D.R.2
  • 12
    • 60949108848 scopus 로고    scopus 로고
    • Micromachined silicon diffraction gratings for infrared spectroscopy
    • A. M. Fowler, ed., Proc. SPIE
    • D. T. Jaffe, L. D. Keller, and O. A. Ershov, “Micromachined silicon diffraction gratings for infrared spectroscopy, ” in Infrared Astronomical Instrumentation, A. M. Fowler, ed., Proc. SPIE 3354, 201-212 (1998).
    • (1998) Infrared Astronomical Instrumentation , vol.3354 , pp. 201-212
    • Jaffe, D.T.1    Keller, L.D.2    Ershov, O.A.3
  • 13
    • 33749322314 scopus 로고    scopus 로고
    • Design for a near infrared immersion echelle spectrograph
    • A. M. Fowler, ed., Proc. SPIE
    • L. D. Keller, D. T. Jaffe, and G. W. Doppmann, “Design for a near infrared immersion echelle spectrograph: breaking the R = 100, 000 barrier from 1.5 to 5 p.m, ” in Infrared Astronomical Instrumentation, A. M. Fowler, ed., Proc. SPIE 3354, 295-304 (1998).
    • (1998) Infrared Astronomical Instrumentation , vol.3354 , pp. 295-304
    • Keller, L.D.1    Jaffe, D.T.2    Doppmann, G.W.3
  • 14
    • 0000848179 scopus 로고
    • The high-resolution cross-dispersed echelle white pupil spectrometer of the McDonald Observatory 2.7-m telescope
    • R. G. Tull, P. J. MacQueen, C. Sneden, and D. Lambert, “The high-resolution cross-dispersed echelle white pupil spectrometer of the McDonald Observatory 2.7-m telescope, ” Publ. As-tron. Soc. Pac. 107, 251-264 (1995).
    • (1995) Publ. As-Tron. Soc. Pac. , vol.107 , pp. 251-264
    • Tull, R.G.1    Macqueen, P.J.2    Sneden, C.3    Lambert, D.4
  • 15
    • 0026206194 scopus 로고
    • Effect of oxidizing ambient on oxygen precipitation in silicon crystals
    • M. Kohketsu and S. Isome, “Effect of oxidizing ambient on oxygen precipitation in silicon crystals, ” Jpn. J. Appl. Phys. 30, L1337-L1339 (1995).
    • (1995) Jpn. J. Appl. Phys. , vol.30 , pp. L1337-L1339
    • Kohketsu, M.1    Isome, S.2
  • 16
    • 0001059915 scopus 로고
    • On etching very narrow grooves in silicon
    • D. L. Kendall, “On etching very narrow grooves in silicon, ” Appl. Phys. Lett. 26, 195-198 (1974).
    • (1974) Appl. Phys. Lett. , vol.26 , pp. 195-198
    • Kendall, D.L.1
  • 18
    • 0037968405 scopus 로고
    • Anisotropic etching for forming isolation slots
    • H. A. Waggener, R. C. Kragness, and A. L. Taylor, “Anisotropic etching for forming isolation slots, ” Electronics 40, 274-276 (1967).
    • (1967) Electronics , vol.40 , pp. 274-276
    • Waggener, H.A.1    Kragness, R.C.2    Taylor, A.L.3
  • 19
    • 0031355251 scopus 로고    scopus 로고
    • AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si (100) in KOH for micormachining applications
    • T. Baum and D. J. Schiffrin, “AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si (100) in KOH for micormachining applications, ” J. Micromech. Microeng. 7, 338-342 (1997).
    • (1997) J. Micromech. Microeng. , vol.7 , pp. 338-342
    • Baum, T.1    Schiffrin, D.J.2
  • 20
    • 0015771980 scopus 로고
    • Anisotropic etching of silicon with KOH-H2O-isopropyl alcohol
    • H. R. Huff and R. R. Burgess, eds, The Electrochemical Society, Princeton, N.J
    • 2O-isopropyl alcohol, ” in Semiconductor Silicon, H. R. Huff and R. R. Burgess, eds. (The Electrochemical Society, Princeton, N.J., 1973), pp. 339-353.
    • (1973) Semiconductor Silicon , pp. 339-353
    • Price, J.B.1
  • 21
    • 0020127035 scopus 로고
    • Silicon as a mechanical material
    • K. E. Petersen, “Silicon as a mechanical material, ” Proc. IEEE 70, 420-457 (1982).
    • (1982) Proc. IEEE , vol.70 , pp. 420-457
    • Petersen, K.E.1
  • 22
    • 0020831535 scopus 로고
    • Aberrated point-spread functions for rotationally symmetric aberrations
    • V. N. Mahajan, “Aberrated point-spread functions for rotationally symmetric aberrations, ” Appl. Opt. 22, 3035-3041 (1983).
    • (1983) Appl. Opt. , vol.22 , pp. 3035-3041
    • Mahajan, V.N.1
  • 23
    • 0008715026 scopus 로고
    • Total illumination of a diffraction image containing spherical aberration
    • R. Barakat, “Total illumination of a diffraction image containing spherical aberration, ” J. Opt. Soc. Am. 51, 152-157 (1961).
    • (1961) J. Opt. Soc. Am. , vol.51 , pp. 152-157
    • Barakat, R.1
  • 24
    • 84938449730 scopus 로고
    • Antenna tolerance theory—a review
    • J. Ruze, “Antenna tolerance theory—a review, ” Proc. IEEE 54, 633-640 (1966).
    • (1966) Proc. IEEE , vol.54 , pp. 633-640
    • Ruze, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.