Interdiffusion in MnIr/NiFe exchange biased layer annealed above 300 °C in the pinned electrode of a magnetic tunnel junction

Journal of Applied Physics

Volumn 93, Issue 11, 2003, Pages 8910-8913

  Yoon, C S ^a   Lee, J H ^a   Kim, C K ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; ELECTRODES; MAGNETIC THIN FILMS; TUNNEL JUNCTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETIC TUNNEL JUNCTIONS (MTJ);

FERROMAGNETIC MATERIALS;

EID: 0037666228     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1565497     Document Type: Article

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