A two steps CVD process for the growth of silicon nano-crystals

Applied Surface Science

Volumn 214, Issue 1-4, 2003, Pages 359-363

  Mazen, F ^a,b   Baron, T ^b   Papon, A M ^b   Truche, R ^b   Hartmann, J M ^b  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b CEA GRENOBLE   (France)

Author keywords

CVD; Nano crystals; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALS; DISSOCIATION; NUCLEATION; SEMICONDUCTING SILICON; SEMICONDUCTOR QUANTUM DOTS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

NANOCRYSTALS;

NANOSTRUCTURED MATERIALS;

EID: 0037533823     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00521-X     Document Type: Article

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