Experimental study of a shearing interferometer concept for at-wavelength characterization of extreme-ultraviolet optics

Applied Optics

Volumn 40, Issue 25, 2001, Pages 4526-4533

  Hegeman, Petra ^a   Christmann, Xavier ^a   Visser, Matthieu ^a   Braat, Joseph ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; LIGHT INTERFERENCE; PATTERN MATCHING; ULTRAVIOLET RADIATION; WAVEFRONTS;

SHEARING INTERFEROMETERS;

INTERFEROMETERS;

EID: 0037486922     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.004526     Document Type: Article

References (16)

1. R. H. Stulen and D. W. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694-699 (1999).
2. J. S. Taylor, G. E. Sommargren, D. W. Sweeney, and R. M. Hudyma, “The fabrication and testing of optics for EUV projection lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 580-590 (1998).
3. P. Naulleau, K. A. Goldberg, S. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, “Characterization of the accuracy of EUV phase-shifting point diffraction interferometry,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 115-123 (1998).
4. A. K. Ray-Chaudhuri, K. D. Krenz, R. P. Nissen, S. J. Haney, C. H. Fields, W. C. Sweatt, and A. A. MacDowell, “Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source,” J. Vac. Sci. Technol. B 14, 3964-3968 (1996).
5. M. Visser, M. Dekker, P. Hegeman, and J. Braat, “Extended-source interferometry for at-wavelength test of EUV-optics,” in Emerging Lithographic Technologies III, Y. Vladimirsky, ed., Proc. SPIE 3676, 253-263 (1999).
6. D. Malacara, “Twyman-Green interferometer,” in Optical Shop Testing, 2nd ed., D. Malacara, ed. (Wiley, New York, 1992), pp. 51-94.
7. A. Cornejo-Rodriguez, “Ronchi test,” in Optical Shop Testing, 2nd ed., D. Malacara, ed. (Wiley, New York, 1992), pp. 321-365.
8. J. Schwider, “Single sideband Ronchi test,” Appl. Opt. 20, 2635-2642 (1981).
9. J. C. Wyant, “Double frequency grating lateral shear interferometer,” Appl. Opt. 12, 2057-2060 (1973).
10. J. E. Bjorkholm, A. A. MacDowell, O. R. Wood II, Z. Tan, B. Lafontaine, andD. M. Tennant, “Phase-measuring interferometry using extreme ultraviolet radiation,” J. Vac. Sci. Technol. B 13, 2919-2922 (1995).
11. J. Braat and A. J. E. M. Janssen, “An improved Ronchi test with extended source,” J. Opt. Soc. A 16, 131-140 (1999).
12. P. Hariharan, B. F. Oreb, and T. Eiju, “Digital phase-shifting interferometry: a simple error-compensating phase calcula tion algorithm,” Appl. Opt. 26, 2504-2506 (1987).
13. J. E. Greivenkamp and J. H. Bruning, “Phase shifting interferometers,” in Optical Shop Testing, 2nd ed., D. Malacara, ed. (Wiley, New York, 1992), pp. 501-598.
14. G. Harbers, P. J. Kunst, and G. W. Leibbrandt, “Analysis of lateral shearing interferograms by use of Zernike polynomials,” Appl. Opt. 35, 6162-6172 (1996).
15. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, Oxford, 1980).
16. G. Leibbrandt, G. Harbers, and P. J. Kunst, “Wave-front analysis with high accuracy by use of a double-grating lateral shearing interferometer,” Appl. Opt. 35, 6151-6161 (1996).