Extended-source interferometry for at-wavelength test of EUV-optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 253-263

  Visser, Matthieu ^a   Dekker, Martijn ^a   Hegeman, Petra ^a   Braat, Joseph ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ENGINEERING RESEARCH; IMAGE QUALITY; INTERFEROMETRY; LASER PRODUCED PLASMAS; OPTICS; SENSITIVITY ANALYSIS; SYNCHROTRONS; ULTRAVIOLET RADIATION; VIBRATIONS (MECHANICAL);

COMPUTER-GENERATED INTERFEROGRAMS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0032650227     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)