Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition

Applied Physics Letters

Volumn 71, Issue 25, 1997, Pages 3604-3606

  Kim, Y ^a   Lee, S M ^a   Park, C S ^a   Lee, S I ^a   Lee, M Y ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; DEPOSITION; ELLIPSOMETRY; FILM GROWTH; MATHEMATICAL MODELS; MORPHOLOGY; OPTICAL PROPERTIES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SUBSTRATES; SURFACE PHENOMENA;

ATOMIC LAYER DEPOSITION; INTERBAND OSCILLATOR ENERGY; LEVENBERG-MARQUARDT ALGORITHM; SELLMEIER DISPERSION; SPECTROSCOPIC PHASE MODULATED ELLIPSOMETER; SUBSTRATE DEPENDENCE;

SEMICONDUCTING FILMS;

EID: 0031362248     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120454     Document Type: Article

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