Vacuum emission and breakdown characteristics of a planar He-Xe microdischarge

Applied Physics Letters

Volumn 76, Issue 5, 2000, Pages 544-546

  Postel, Olivier B ^a   Cappelli, Mark A ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012574630     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125813     Document Type: Article

References (13)

1. H. S. Jeong, J. H. Seo, C. K. Yoon, J. K. Kim, and K. W. Whang, J. Appl. Phys. 85, 3092 (1999).
2. R. T. McGrath, R. Veerasingam, J. A. Hunter, P. D. Rockett, and R. B. Campbell, IEEE Trans. Plasma Sci. 26, 1532 (1998).
3. J. R. Gottschalk, O. Shvydky, A. D. Compaan, C. E. Theodosiou, and W. Williamson Jr., IEEE Trans. Plasma Sci. 27, 772 (1999).
4. K. Tachibana, N. Kosugi, and T. Sakai, Appl. Phys. Lett. 25, 935 (1994).
5. S. Rauf and M. J. Kushner, J. Appl. Phys. 85, 3460 (1999).
6. S. Rauf and M. J. Kushner, J. Appl. Phys. 85, 3470 (1999).
7. R. Veerasingam, R. B. Campbell, and R. T. McGrath, Plasma Sources Sci. Technol. 6, 157 (1997).
8. R. Veerasingam, R. B. Campbell, and R. T. McGrath, IEEE Trans. Plasma Sci. 23, 688 (1995).
9. R. B. Campbell, R. Veerasingam, and R. T. McGrath, IEEE Trans. Plasma Sci. 23, 698 (1995).
10. H. S. Jeong, B. J. Shin, and K. W. Whang, IEEE Trans. Plasma Sci. 27, 171 (1999).
11. J. P. Boeuf and L. C. Pitchford, IEEE Trans. Plasma Sci. 24, 95 (1996).
12. Y. Ikeda, J. P. Verboncoeur, P. J. Christenson, and C. K. Birdsall, J. Appl. Phys. 86, 2431 (1999).
13. Y. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1997), p. 134.