Ultra thin Al 2 O 3 films grown on Ni 3 Al(1 0 0)

Applied Surface Science

Volumn 206, Issue 1-4, 2003, Pages 29-36

  Podgursky, V ^a,b   Costina, I ^a   Franchy, R ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b TALLINN UNIVERSITY OF TECHNOLOGY   (Estonia)

Author keywords

Al 2 O 3; Auger electron spectroscopy; High resolution electron energy loss spectroscopy; Intermetallic alloys; Low energy electron diffraction; Ni 3 Al; Oxidation; Scanning tunneling microscopy

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; ELECTRON ENERGY LOSS SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; INTERMETALLICS; LATTICE CONSTANTS; LOW ENERGY ELECTRON DIFFRACTION; NICKEL COMPOUNDS; OXIDATION; SCANNING TUNNELING MICROSCOPY;

HEXAGONAL STRUCTURES;

THIN FILMS;

EID: 0037441137     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00802-4     Document Type: Article

References (27)

1. Stoloff N.S., Liu C.T., Deevi S.C. Intermetallics. 8:2000;1313.
2. Moodera J.S., Mathon G. J. Magn. Magn. Mater. 200:1999;248.
3. Ando Y., Yokota M., Tezuka N., Mijazaki T. J. Magn. Magn. Mater. 198-199:1999;155.
4. J. Schmalhorst, H. Brückl, M. Justus, A. Thomas, G. Reiss, M. Vieth, G. Gieres, J. Wecker, J. Appl. Phys. (2001) 586.
5. DeTeresa J.M., Barthelemy A., Fert A., Contour J.P., Montalgne F., Seneor P. Science. 286:1999;507.
6. Kubota H., Watanabe T., Miyazaki T. J. Magn. Magn. Mater. 198-199:1999;173.
7. Jaeger R.M., Kuhlenbeck H., Freund H.-J., Wuttig M., Hoffmann W., Franchy R., Ibach H. Surf. Sci. 259:1991;235.
8. Franchy R. Surf. Sci. Rep. 38(6-8):2000;195.
9. Bardi U., Atrei A., Rovida G. Surf. Sci. 268:1992;87.
10. Libuda J., Winkelmann F., Bäumer M., Bertrams T., Freund H.J., Neddermeyer H., Müller K. Surf. Sci. 318:1994;61.
11. Costina I., Franchy R. Appl. Phys. Lett. 78:2001;4139.
12. Sondericker D., Jona F., Marcus P.M. Phys. Rev. B. 33:1986;900.
13. Felcher G.P., Konvel J.S., Miller A.E. Phys. Rev. B. 16:1977;2124.
14. Bäumer M., Freund H.-J. Prog. Surf. Sci. 61:1999;127.
15. H.-J. Freund, H. Kuhlenbeck, M. Neumann, Adsorption on Ordered Surface Ionic Solids and Thin Films, Vol. 33, Springer, Berlin, 1993.
16. Franchy R., Masuch J., Gassmann P. Appl. Surf. Sci. 93:1996;31.
17. Becker C., Kandler J., Raaf H., Linke R., Pelster T., Dräger M., Tanemura M., Wandelt K. J. Vac. Sci. Technol. A. 16:1998;1000.
18. R.C. Weast and M.J. Astle, CRC Handbook of Chemistry and Physics, 59th Edition, CRC Press, Boca Raton, FL, 1978/1979, p. D-67.
19. Chu Y.T., Bates J.B., White C.W., Farlow G.C. J. Appl. Phys. 64:1988;3727.
20. Rechtien J.J., Kannewurf C.R., Brittain J.O. J. Appl. Phys. 38:1967;3045.
21. Kliewer K.L., Fuchs R. Phys. Rev. 144:1966;495.
22. Kliewer K.L., Fuchs R. Adv. Chem. Phys. 27:1974;355.
23. Blum R.-P., Niehus H. Appl. Phys. A. 66:1998;529.
24. Schmitz G., Gassmann P., Franchy R. J. Appl. Phys. 83:1998;2533.
25. Gautier M., Durand J.P., Pham Van L. Surf. Sci. Lett. 250:1991;71.
26. Rosenhahn A., Schneider J., Becker C., Wandelt K. J. Vac. Sci. Technol. A. 18:2000;1923.
27. Magtoto N.P., Niu C., Anzaldua M., Kelber J.A., Jennison D.R. Surf. Sci. 427:2001;L157.