Oxidation of Ni3Al(111) at 600, 800, and 1050 K investigated by scanning tunneling microscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1923-1927

  Rosenhahn, A ^a   Schneider, J ^a   Becker, C ^a   Wandelt, K ^a  

^a UNIVERSITY OF BONN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTAL ORIENTATION; HIGH TEMPERATURE EFFECTS; INTERMETALLICS; SCANNING TUNNELING MICROSCOPY; THERMOOXIDATION; THIN FILMS;

MOIRE STRUCTURE; NICKEL ALUMINIDE;

NICKEL ALLOYS;

EID: 0034226680     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582447     Document Type: Article

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