Adatom kinetics on and below the surface: The existence of a new diffusion channel

Physical Review Letters

Volumn 90, Issue 5, 2003, Pages

  Neugebauer, Jörg ^a   Zywietz, Tosja K ^a   Scheffler, Matthias ^a   Northrup, John E ^b   Chen, Huajie ^c   Feenstra, R M ^c  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b PALO ALTO RESEARCH CENTER   (United States)

^c CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; GALLIUM NITRIDE; KINETIC THEORY; OPTIMIZATION; SURFACE ACTIVE AGENTS; THIN FILMS;

ADATOM KINETICS; SEMICONDUCTOR SURFACE;

SURFACES;

EID: 0037422959     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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