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Volumn 14, Issue 4, 2001, Pages 657-668
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Optimizing two-photon initiators and exposure conditions for three-dimensional lithographic microfabrication
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Author keywords
Micro electromechanical systems; Micro optics; Microfluidics; Three dimensional lithographic microfabrication; Two photon absorption; Two photon induced polymerization
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Indexed keywords
ARTICLE;
CHEMICAL STRUCTURE;
CHROMATOPHORE;
ELECTRON;
LITHOGRAPHY;
OPTICS;
PHOTON;
POLYMERIZATION;
SCANNING ELECTRON MICROSCOPY;
TECHNOLOGY;
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EID: 0035747127
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.14.657 Document Type: Article |
Times cited : (113)
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References (31)
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