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Volumn 14, Issue 4, 2001, Pages 657-668

Optimizing two-photon initiators and exposure conditions for three-dimensional lithographic microfabrication

Author keywords

Micro electromechanical systems; Micro optics; Microfluidics; Three dimensional lithographic microfabrication; Two photon absorption; Two photon induced polymerization

Indexed keywords

ARTICLE; CHEMICAL STRUCTURE; CHROMATOPHORE; ELECTRON; LITHOGRAPHY; OPTICS; PHOTON; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; TECHNOLOGY;

EID: 0035747127     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.657     Document Type: Article
Times cited : (113)

References (31)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.