Self-assembling formation of silicon quantum dots with a germanium core by low-pressure chemical vapour deposition

Nanotechnology

Volumn 14, Issue 4, 2003, Pages 413-415

  Darma, Yudi ^a   Takaoka, Ryuta ^a   Murakami, Hideki ^a   Miyazaki, Seiichi ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; HELIUM; INTERFACES (MATERIALS); SELF ASSEMBLY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW-PRESSURE CHEMICAL VAPOUR DEPOSITION (LPCVD);

SEMICONDUCTOR QUANTUM DOTS;

EID: 0037392524     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/14/4/301     Document Type: Article

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