Self-assembling formation of silicon quantum dots by low pressure chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 243-248

  Nakagawa, K ^a   Fukuda, M ^a   Miyazaki, S ^a   Hirose, M ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH FROM MELT; DECOMPOSITION; NUCLEATION; SILANES; SILICA; SILICON WAFERS; SURFACES; TRANSMISSION ELECTRON MICROSCOPY;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; SILICON QUANTUM DOTS; THERMAL DECOMPOSITION;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0030707986     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)