Study of structural and optical properties of nanocrystalline silicon embedded in SiO2

Thin Solid Films

Volumn 375, Issue 1-2, 2000, Pages 137-141

  Yun, F ^a   Hinds, B J ^a   Hatatani, S ^a   Oda, S ^a   Zhao, Q X ^b   Willander, M ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF GOTHENBURG   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION EFFECTS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUENCHING; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

INITIAL COMPOSITION;

OPTICAL FILMS;

EID: 0342973179     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01259-1     Document Type: Article

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