Characteristics of secondary etching of SiO2 by ions reflected from a primary SiO2 target in a CHF3 plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 2, 2003, Pages 404-410

  Lee, Gyeo Re ^a   Hwang, Sung Wook ^a   Min, Jae Mo ^a   Moon, Sang Heup ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; IONS; PLASMAS; SILICA; SURFACE ROUGHNESS;

SHADOWING EFFECT;

ETCHING;

EID: 0037348213     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1540982     Document Type: Article

References (21)

1. J. C. Arnold and H. H. Sawin, J. Appl. Phys. 70, 5314 (1991).
2. S. G. Ingram, J. Appl. Phys. 68, 500 (1990).
3. C. W. Chung, Y. H. Byun, and H. I. Kim, Korean J. Chem. Eng. 19, 524 (2002).
4. G.-R. Lee, B.-O. Cho, S.-W. Hwang, and S. H. Moon, J. Vac. Sci. Technol. B 19, 172 (2001).
5. S. V. Nguyen, D. Dobuzinsky, S. R. Stiffler, and G. Chrisman, J. Electrochem. Soc. 138, 1112 (1991).
6. T. J. Dalton, J. C. Arnold, H. H. Sawin, S. Swan, and D. Corliss, J. Electrochem. Soc. 140, 2395 (1993).
7. A. C. Westerheim, A. H. Labun, J. H. Dubash, J. C. Arnold, H. H. Sawin, and V. Yu-Wang, J. Vac. Sci. Technol. A 13, 853 (1995).
8. Y. Mitsuoka, H. Toyoda, and H. Sugai, Jpn. J. Appl. Phys., Part 2 34, L1486 (1995).
9. H. Sugai, Y. Mitsuoka, and H. Toyoda, J. Vac. Sci. Technol. A 16, 290 (1998).
10. H. Yamamoto, Y. Baba, and T. A. Sasaki, Appl. Surf. Sci. 100-101, 333 (1996).
11. Y. G. Shen, I. Bello, and W. M. Lau, Nucl. Instrum. Methods Phys. Res. B 73, 35 (1993).
12. C. F. Abrams and D. B. Graves, J. Vac. Sci. Technol. A 16, 3006 (1998).
13. B. A. Helmer and D. B. Graves, J. Vac. Sci. Technol. A 16, 3502 (1998).
14. B. O. Cho, S. W. Hwang, J. H. Ryu, and S. H. Moon, Rev. Sci. Instrum. 70, 2458 (1999).
15. B.-O. Cho, S.-W. Hwang, I.-W. Kim, and S. H. Moon, J. Electrochem. Soc. 146, 350 (1999).
16. B.-O. Cho, S.-W. Hwang, G.-R. Lee, and S. H. Moon, J. Vac. Sci. Technol. A 18, 2791 (2000).
17. Y. B. Hahn and S. J. Pearton, Korean J. Chem. Eng. 17, 304 (2000).
18. L. C. Feldman and J. W. Mayer, Fundamentals of Surface and Thin Film Analysis (Elsevier, New York, 1986), p. 15.
19. S. Samukawa and T. Mukai, J. Vac. Sci. Technol. A 18, 167 (2000).
20. T. Shibano, N. Fujiwara, M. Hirayama, H. Nagata, and K. Demizu, Appl. Phys. Lett. 63, 2336 (1993).
21. M. Schaepkens, T. E. F. M. Standaert, N. R. Rueger, P. G. M. Sebel, G. S. Oehrlein, and J. M. Cook, J. Vac. Sci. Technol. A 17, 26 (1999).