Dissociative scattering of low-energy SiF 3 + and SiF + ions (5-200 eV) on Cu(100) surface

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 333-337

  Yamamoto, Hiroyuki ^a   Baba, Yuji ^a   Sasaki, Teikichi A ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DISSOCIATION; ELECTRON ENERGY LEVELS; FLUORINE COMPOUNDS; IRRADIATION; MATHEMATICAL MODELS; MOLECULAR VIBRATIONS; SURFACES;

DISSOCIATIVE SCATTERING; IMPULSIVE COLLISION MODEL; PARENT MOLECULAR IONS; SCATTERING ION INTENSITY; SILICON FLUORIDE; VIBRATIONAL EXCITATION;

ELECTRON SCATTERING;

EID: 0030564555     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00236-X     Document Type: Article

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