Low-threshold field electron emission of Si micro-tip arrays produced by laser ablation

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 3, 2003, Pages 413-416

  Karabutov, A V ^a   Frolov, V D ^a   Loubnin, E N ^a   Simakin, A V ^a   Shafeev, G A ^a  

^a PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; LASER ABLATION; LASER BEAMS; LASER PULSES; MICROSTRUCTURE; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON WAFERS; STOICHIOMETRY;

FLAT-SCREEN TECHNIQUE; LOW THRESHOLD FIELD ELECTRON EMISSION; X-RAY ELECTRON SPECTROSCOPY;

ELECTRON EMISSION;

EID: 0037339514     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1715-y     Document Type: Article

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