Peculiarities of field electron emission from CVD diamond films

Journal De Physique. IV : JP

Volumn 6, Issue 5, 1996, Pages

  Karabutov, A V ^a   Konov, V I ^a   Pimenov, S M ^a   Frolov, V D ^a   Obraztsova, E D ^a   Polyakov, V I ^b   Rossukanyi, N M ^b  

^a PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

^b INSTITUTE OF RADIO ENGINEERING AND ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ELECTRIC FIELDS; ELECTRON EMISSION; ELECTRONS; FILM GROWTH; MAPPING; PLASMA APPLICATIONS; SCANNING TUNNELING MICROSCOPY; SILICON; SUBSTRATES; SURFACE TREATMENT;

DC ARC DISCHARGE PLASMA CHEMICAL VAPOR DEPOSITION; EFFECTIVE WORK FUNCTION; EMISSION CURRENT; FIELD ELECTRON EMISSION; SILICON SUBSTRATES;

DIAMOND FILMS;

EID: 0030233678     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1996518     Document Type: Article

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