Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms

IEEE Transactions on Evolutionary Computation

Volumn 7, Issue 1, 2003, Pages 69-82

  Robin, Franck ^a   Orzati, Andrea ^a   Moreno, Esteban ^a   Homan, Otte J ^a   Bächtold, Werner ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Electron beam lithography; Genetic algorithm; Optimization; Simplex downhill algorithm; Simulation

Indexed keywords

COMPUTER SIMULATION; GENETIC ALGORITHMS; MICROWAVE ACOUSTIC DEVICES; NETWORKS (CIRCUITS); OPTIMIZATION; PROBLEM SOLVING; TOPOLOGY;

SIMPLEX-DOWNHILL ALGORITHMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0037297961     PISSN: 1089778X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TEVC.2002.806166     Document Type: Article

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