Characterization of damage in reactive ion etched ZnTe

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 1, 2003, Pages 59-61

  Guo, Qixin ^a   Matsumoto, Yuichi ^a   Tanaka, Tooru ^a   Nishio, Mitsuhiro ^a   Ogawa, Hiroshi ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION; EXCITONS; HYDROGEN; ION BOMBARDMENT; METALLORGANIC VAPOR PHASE EPITAXY; METHANE; MORPHOLOGY; PHOTOLUMINESCENCE; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

FREE EXCITON EMISSIONS; LOW TEMPERATURE PHOTOLUMINESCENCE MEASUREMENT; SURFACE DAMAGE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 0037273443     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521962     Document Type: Article

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