메뉴 건너뛰기




Volumn 19, Issue 5, 2001, Pages 2232-2234

Characteristics of reactive ion etching for zinc telluride using CH4 and H2 gases

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HYDROGEN; METHANE; PLASMAS; PRESSURE EFFECTS; PROFILOMETRY; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

EID: 0035441105     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1379802     Document Type: Article
Times cited : (26)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.