SCOPUS 정보 검색 플랫폼

Applied Physics A: Materials Science and Processing

Volumn 72, Issue 5, 2001, Pages 557-564

Spectroscopic in situ diagnostics of boron nitride film growth in plasma-enhanced deposition

(4) Lunk, A a Bachem, P a Scheible, P a Ulrich, L a

a UNIVERSITY OF STUTTGART (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; ELECTRONS; ELLIPSOMETRY; ENERGY GAP; FILM GROWTH; INFRARED SPECTROSCOPY; ION BOMBARDMENT; IONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; RESIDUAL STRESSES; SUBSTRATES;

BORON NITRIDE FILM; POLARIZED INFRARED REFLECTION SPECTROSCOPY; STRESS REDUCTION;

THIN FILMS;

EID: 0034969566 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100814 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.