Characterization of interface of c-BN film deposited on silicon(100) substrate

Thin Solid Films

Volumn 355, Issue , 1999, Pages 229-232

  Tian, Jingze ^a   Xia, Lifang ^a   Ma, Xinxin ^a   Sun, Yue ^a   Byon, Eung Sun ^b   Lee, Sung Hun ^b   Lee, Sang Ro ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CUBIC BORON NITRIDE; DEPOSITION; ETCHING; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETICALLY ENHANCED ACTIVE REACTION EVAPORATION (ME-ARE);

CERAMIC COATINGS;

EID: 0033357945     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00504-0     Document Type: Article

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