Reactive R.F. Magnetron sputtering deposition of WO3 thin films

Sensors and Actuators, B: Chemical

Volumn 84, Issue 1, 2002, Pages 49-54

  Lollman, D B B ^a   Lemire, C ^a   Al Mohammad, A ^a   Gillet, E ^a   Aguir, K ^a  

^a CNRS   (France)

Author keywords

Atomic force microscopy (AFM); Electron microscopy; Gas sensors; Reactive R.F. magnetron sputtering; WO3 thin films; X ray photoelectron spectroscopy (XPS)

Indexed keywords

EID: 0037198107     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)01073-5     Document Type: Article

References (19)