Ch3 and Cl2 coadsorbed on Si/Cu(100)

Catalysis Letters

Volumn 68, Issue 3-4, 2000, Pages 147-152

  Han, J ^a   Gheyas, S I ^a   Strongin, D R ^a   Hinch, B J ^b   Wright, A P ^c  

^a Temple University   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c DOW CORNING CORPORATION   (United States)

Author keywords

Chlorine; Copper silicon; Methyl; Methylchlorosilane; Rochow reaction; Temperature programmed desorption; X ray photoelectron spectroscopy

Indexed keywords

EID: 0011206089     PISSN: 1011372X     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1019012326536     Document Type: Article

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