Chemistry of the direct synthesis of methylchlorosilanes from methyl + chlorine monolayers on a Cu3Si surface

Catalysis Letters

Volumn 46, Issue 1-2, 1997, Pages 127-132

  Sun, Dong Hong ^a   Bent, Brian E ^a   Wright, Antony P ^b   Naasz, Brian M ^b  

^a Och Spine at New York Presbyterian Hospitals   (United States)

^b DOW CORNING CORPORATION   (United States)

Author keywords

Alloy; Cu3Si; Direct process; Methyl radical; Methylchlorosilane; Monolayer; Surface; Ultra high vacuum

Indexed keywords

EID: 0001068040     PISSN: 1011372X     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1019025325414     Document Type: Article

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