Comparison of the interaction of Cl2 and Br2 with Cu(100)

Surface Science

Volumn 370, Issue 1, 1997, Pages

  Nakakura, C Y ^a   Phanse, V M ^a   Altman, E I ^a  

^a Yale University   (United States)

Author keywords

Bromine; Chlorine; Copper; Etching; Halogenation; LEED; Oxidation; TPD

Indexed keywords

ADSORPTION; ANNEALING; BROMINE COMPOUNDS; CHEMISORPTION; CHLORINE COMPOUNDS; EPITAXIAL GROWTH; ETCHING; HALOGENATION; LOW ENERGY ELECTRON DIFFRACTION; OXIDATION; TEMPERATURE PROGRAMMED DESORPTION; VAPOR PRESSURE;

HALIDE FORMATION; HALIDE SUBLIMATION;

COPPER;

EID: 0030869840     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01171-5     Document Type: Article

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