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Journal of Materials Research

Volumn 15, Issue 9, 2000, Pages 1955-1961

Thermal stability of RuO2, BaxSr1-xTiO3/RuO2, and BaxSr1-xTiO3/Pt/Ti/SiO2 on Si(100)

(3) Kang, T S a Kim, Y S a Je, Jung Ho a

a Pohang University of Science and Technology (POSTECH) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BARIUM COMPOUNDS; CRYSTALLIZATION; INTERFACIAL ENERGY; OXIDATION; RUTHENIUM COMPOUNDS; STRAIN; SURFACE ROUGHNESS; TEXTURES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

INTERFACE ROUGHNESS;

DIELECTRIC MATERIALS;

EID: 0034285310 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/jmr.2000.0282 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.