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Volumn 521, Issue 3, 2002, Pages 129-138

Surface chemistry of TiCl4 on clean and hydrogen modified W(1 1 0): Identification of surface intermediates

Author keywords

Chemisorption; Single crystal surfaces; Synchrotron radiation photoelectron spectroscopy; Titanium; Tungsten

Indexed keywords

ADSORPTION; CHEMISORPTION; DECOMPOSITION; HYDROGEN; PHOTOELECTRON SPECTROSCOPY; SINGLE CRYSTALS; SURFACE CHEMISTRY; SURFACE TREATMENT; SYNCHROTRON RADIATION; TUNGSTEN;

EID: 0037146836     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)02310-5     Document Type: Article
Times cited : (8)

References (37)
  • 1
    • 0004087241 scopus 로고
    • Chemical vapor deposition for microelectronics
    • Noyes Publications, Park Ridge, NJ
    • Sherman A. Chemical Vapor Deposition for Microelectronics. Principles, Technology and applications. 1987;Noyes Publications, Park Ridge, NJ. 215 pp.
    • (1987) Principles, Technology and applications , pp. 215
    • Sherman, A.1
  • 23
    • 0011822675 scopus 로고
    • J. Chem. Phys. 79:1983;26.
    • (1983) J. Chem. Phys. , vol.79 , pp. 26


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.