Structural characterization of TiNxOy/TiO2 single crystalline and nanometric multilayers grown by LP-MOCVD on (110)TiO2

Thin Solid Films

Volumn 400, Issue 1-2, 2001, Pages 125-129

  Fabreguette, F ^a   Guillot, J ^a   Cardoso, L P ^b   Marcon, R ^b   Imhoff, L ^a   Marco De Lucas, M C ^a   Sibillot, P ^a   Bourgeois, S ^a   Dufour, P ^a   Sacilotti, M ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

MOCVD; Multilayers; Nanometric films; Single crystalline films; Titanium oxinitride

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; MULTILAYERS; NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; SINGLE CRYSTALS; SUPERLATTICES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

NANOMETRIC FILMS;

THIN FILMS;

EID: 0035803103     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01493-6     Document Type: Conference Paper

References (13)