Growth and characterization of well-aligned nc-Si/SiOx composite nanowires

Advanced Materials

Volumn 14, Issue 22, 2002, Pages 1643-1646

  Wu, Jih Jen ^a   Wong, Te Chi ^a   Yu, Chi Chung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; CRYSTAL GROWTH; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FLUORESCENCE; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; ULSI CIRCUITS; X RAY DIFFRACTION ANALYSIS;

COMPOSITE NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 0037132186     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(20021118)14:22<1643::AID-ADMA1643>3.0.CO;2-Y     Document Type: Article

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