Chemical vapor deposition of tantalum nitride films using pentakis(diethylamido)tantalum and ammonia

Materials Research Society Symposium - Proceedings

Volumn 514, Issue , 1998, Pages 531-536

  Cho, Sung Lae ^a   Kim, Ki Bum ^a   Min, Seok Hong ^a   Shin, Hyun Kook ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMMONIA; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; ELECTRIC CONDUCTIVITY MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PENTAKISDIETHYLAMIDO TANTALUM; TANTALUM NITRIDE;

TANTALUM COMPOUNDS;

EID: 0032297040     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-514-531     Document Type: Conference Paper

References (15)