Heat resistant relief patterns made from directly patternable polybenzoxazole precursors

Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering

Volumn 60, Issue , 1989, Pages 629-633

  Ahne, H ^a   Hammerschmidt, A ^a   Schmidt, E ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY--PHOTOLITHOGRAPHY; PHOTORESISTS--PERFORMANCE; PLASTICS FILMS--PHOTOSENSITIVE; POLYMERS--DIELECTRIC PROPERTIES;

DIRECTLY PATTERNABLE PRECURSORS; HEAT RESISTANT PHOTOPATTERNABLE FILMS; HEAT RESISTANT RELIEF PATTERNS; HIGH TEMPERATURE STABLE FILMS; POLYBENZOXAZOLE PRECURSORS; POSITIVE RESISTS;

AROMATIC POLYMERS;

EID: 0024863997     PISSN: 07430515     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)