Structural and dielectric characterization of the (Ba 1-xSr x)(Ti 0.9Sn 0.1)O 3 thin films deposited on Pt/Ti/SiO 2/Si substrate by radio frequency magnetron sputtering

Journal of Applied Physics

Volumn 92, Issue 4, 2002, Pages 2100-2107

  Wang, Moo Chin ^a   Tsai, Cheng Chi ^b   Wu, Nan Chung ^b   Hung, Kun Ming ^a  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; DEPOSITION TEMPERATURES; DIELECTRIC CHARACTERIZATION; ELECTRON DIFFRACTION ANALYSIS; GRAIN SIZE; HIGH DIELECTRIC CONSTANTS; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; REMNANT POLARIZATIONS; RF-MAGNETRON SPUTTERING;

ELECTRIC FIELDS; MAGNETRON SPUTTERING; PLATINUM; TIN; X RAY DIFFRACTION;

THIN FILMS;

EID: 0037103672     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1492002     Document Type: Article

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