Substrate bias effect on the formation of nanocrystalline diamond films by microwave plasma-enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 92, Issue 4, 2002, Pages 2133-2138

  Yang, Tien Syh ^a   Lai, Jir Yon ^a   Wong, Ming Show ^a   Cheng, Chia Liang ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS-ENHANCED NUCLEATION; CRYSTALLINITIES; ETCHING EFFICIENCY; GRAIN SIZE; MICROCRYSTALLINE DIAMOND FILMS; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE DIAMOND FILMS; NEGATIVE SUBSTRATES; SUBPLANTATION; SUBSTRATE BIAS EFFECTS;

CHEMICAL VAPOR DEPOSITION; GROWTH RATE; IONS; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VAPORS;

DIAMOND FILMS;

EID: 0037103460     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1492864     Document Type: Article

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