Characterization on microstructures of tungsten/barrier metals (TiN,WN x)/silicon multilayer films

Journal of Applied Physics

Volumn 91, Issue 12, 2002, Pages 9788-9793

  Yang, Jun Mo ^a   Choi, Il Sang ^a   Kim, Yong Soo ^a   Park, Ju Chul ^a   Lee, Sang Moo ^a   Hong, Tae Eun ^a   Park, Yoon Beak ^a   Lee, Soun Young ^a   Kim, Yil Wook ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; BARRIER METALS; CHEMICAL ETCHING; ELEMENTAL MAPPING; PREFERRED ORIENTATIONS; STACKED FILM; TIN FILMS;

AMORPHOUS FILMS; MICROSTRUCTURE; MULTILAYER FILMS; PHOTOELECTRONS; SILICON; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

AMORPHOUS SILICON;

EID: 0037098018     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1479753     Document Type: Article

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