Thermal stability of sputter-deposited TiSi2 films with crystal orientation

Electrochemical and Solid-State Letters

Volumn 2, Issue 12, 1999, Pages 642-644

  Park, Dae Gyu ^a   Suh, You Seok ^a   Lee, Sang Hyeob ^a   Kim, Sam Dong ^a   Kim, Chung Tae ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; THIN FILMS; TITANIUM COMPOUNDS;

FURNACE ANNEALING;

METALLIC FILMS;

EID: 0033283321     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390934     Document Type: Article

References (15)

1. J. Lasky, J. S. Nakos, O. J. Cain, and P. J. Geiss, IEEE Trans. Electron Devices, 38, 262 (1991).
2. R. Beyers and R. Sinclair, J. Appl. Phys., 57, 5240 (1985).
3. H. Jeon, C. A. Sukow, J. W. Honeycutt, G. A. Rozgonyi, and R. J. Nemanich, J. Appl. Phys., 71, 4269 (1992).
4. I. Sakai, H. Abiko, H. Kawaguchi, T. Hirayama, L. E. G. Johnson, and K. Okabe, VLSI Symp. Dig., 66 (1992).
5. R. W. Mann, G. L. Miles, T. A. Knotts, D. W. Rakowski, L. A. Clevenger, J. M. E. Harper, F. M. D'Heurle, and C. Cabral, Jr., Appl. Phys. Lett.. 67, 3729 (1995).
6. R. W. Mann, L. A. Clevenger, P. D. Agnello, and F. R. White, IBM J. Res. Dev., 39, 403 (1995).
7. K. Fujii, K. Kikula, and T. Kikkawa, VLSI Symp. Dig., 57 (1995).
8. R. T. Tung, Appl. Phys. Lett., 68, 1933 (1996).
9. R. T. Tung, K. Fujii, K. Kikuta, S. Chikaki, and T. Kikkawa, Appl. Phys. Lett., 70, 2386 (1997).
10. N. I. Lee, Y. W. Kim, J. W. Ko, I. K. Kim, and S. T. Ahn, in Conference on Solid State Devices and Materials, Makuhari, 832 (1993).
11. S. Nygren, M. Ostling, C. S. Peterson, H. Norstrom, K. B. Ryden, R. Ruchta, and C. Chatfield, Thin Solid Films, 168, 325 (1989).
12. M. Tanielian, R. Lajos, S. Blackstone, and D. Pramanik, J. Electrochem. Soc., 132, 1456 (1985).
13. H.-S. Kim, D.-H. Ko, D.-L. Bae, N.-I. Lee, D.-W. Kim, H.-K. Kang, and M.Y. Lee, J. Electron. Mater., 27, L21 (1998).
14. L. A. Clevenger, C. Cabral, Jr., R. A. Roy, C. Lavoie, R. Viswanathan, K. L. Saenger, J. Jordan-Sweet, G. Morales, K. L. Ludwig, Jr., and G. B. Stephenson, Mater. Res. Soc. Symp. Proc., 402, 257 (1996).
15. M. Tanielian, S. Blackstone, and R. Lajos, Appl. Phys. Lett., 45, 444 (1984).