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Volumn 40, Issue 10, 2002, Pages 1560-1571
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Structural control of oligomeric methyl silsesquioxane precursors and their thin-film properties
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Author keywords
Curing of polymers; Dielectric properties; Oligomers; Polysiloxanes; Thin films
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Indexed keywords
CONDENSATION REACTIONS;
DIELECTRIC PROPERTIES;
HYDROLYSIS;
KETONES;
MOLECULAR STRUCTURE;
PH;
PLASTIC FILMS;
REFRACTIVE INDEX;
SILANES;
SILICONES;
SOLVENTS;
THIN FILMS;
CAGE STRUCTURES;
METHYL ISOBUTYL KETONE;
METHYL TRIMETHOXYSILANE;
MOLAR RATIO;
NETWORK STRUCTURES;
OLIGOMERIC METHYL SILSEQUIOXANE PRECURSORS;
TETRAHYDROFURAN;
OLIGOMERS;
CURING;
DIELECTRIC PROPERTY;
FILM;
OLIGOMER;
PRECURSOR;
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EID: 0037094224
PISSN: 0887624X
EISSN: None
Source Type: Journal
DOI: 10.1002/pola.10246 Document Type: Article |
Times cited : (95)
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References (24)
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