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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 3 B, 2002, Pages

Formation of Al dot hexagonal array on Si using anodic oxidation and selective etching

(4) Shingubara, Shoso a Murakami, Yasuhiko a Sakaue, Hiroyuki a Takahagi, Takayuki a

a HIROSHIMA UNIVERSITY (Japan)

Author keywords

Anodic oxidation; Dot; Nanohole; Porous alumina; Selective etching; Self organization

Indexed keywords

ALUMINA; ANODIC OXIDATION; ELECTRIC CONDUCTIVITY; ETCHING; NANOTECHNOLOGY; POROUS MATERIALS; SEMICONDUCTING SILICON;

POROUS ALUMINA; SELECTIVE ETCHING;

SEMICONDUCTING FILMS;

EID: 0037088527 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.l340 Document Type: Article

Times cited : (22)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.