Fabrication of nano holes array on Si substrate using anodically oxidized aluminum etching mask

1999 International Microprocesses and Nanotechnology Conference

Volumn , Issue , 1999, Pages 124-125

  Shingubara, Shoso ^a   Okino, Osamu ^a   Nakaso, Koji ^a   Sakaue, Hiroyuki ^a   Takahagi, Takayuki ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ETCHING; FABRICATION; NANOTECHNOLOGY; SEMICONDUCTING SILICON; SEMICONDUCTOR QUANTUM DOTS; SILICON;

ALUMINUM ETCHING; ETCHING PROCESS; NANOHOLE ARRAYS; PATTERN TRANSFERS; POROUS ALUMINA; QUANTUM DOT DEVICES; SI SUBSTRATES; SINGLE CRYSTALLINE SUBSTRATES;

SUBSTRATES;

EID: 0009752464     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.1999.797508     Document Type: Conference Paper

References (0)