Fermi level pinning on HF etched silicon surfaces investigated by photoelectron spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 1, 1999, Pages 164-169

  Schlaf, R ^a   Hinogami, R ^b   Fujitani, M ^b   Yae, S ^b,c   Nakato, Y ^b  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b OSAKA UNIVERSITY   (Japan)

^c UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033479318     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581568     Document Type: Article

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