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Materials Science and Engineering: B

Volumn 89, Issue 1-3, 2002, Pages 310-313

Low-pressure chemical vapour deposition growth of epitaxial silicon selective to silicon nitride

(2) Lloyd, N S a Bonar, J M a

a UNIVERSITY OF SOUTHAMPTON (United Kingdom)

Author keywords

Dichlorosilane; Epitaxy; Low pressure chemical vapour deposition; Nitride; Selective; Selective epitaxial growth

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; HETEROJUNCTIONS; PRESSURE EFFECTS; SILICON NITRIDE; SUBSTRATES;

SELECTIVE EPITAXIAL GROWTH (SEG);

SILICON WAFERS;

EID: 0037074864 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(01)00805-4 Document Type: Conference Paper

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.