Quality of selective silicon epitaxial films deposited using disilane and chlorine

Journal of the Electrochemical Society

Volumn 146, Issue 6, 1999, Pages 2337-2343

  O'Neil, Patricia A ^a   Öztürk, Mehmet C ^a   Batchelor, Alan D ^a   Xu, Meimei ^a   Maher, Dennis M ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHLORINE; EPITAXIAL GROWTH; MOSFET DEVICES; SEMICONDUCTOR DIODES; SILANES; SILICON WAFERS;

DISILANE; RAPID THERMAL CHEMICAL VAPOR DEPOSITION;

THICK FILMS;

EID: 0345476899     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391937     Document Type: Article

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