Rapid thermal oxidation of epitaxial SiGe thin films

Materials Science and Engineering: B

Volumn 89, Issue 1-3, 2002, Pages 269-273

  Terrasi, A ^a,b   Scalese, S ^b   Adorno, R ^a   Ferlito, E ^a   Spadafora, M ^a   Rimini, E ^a,b  

^a UNIVERSITY OF CATANIA   (Italy)

^b INFM   (Italy)

Author keywords

Diffusion; Epitaxy; Oxides; Rapid thermal processes; Segregation; SiGe

Indexed keywords

EPITAXIAL GROWTH; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEGREGATION (METALLOGRAPHY); SEMICONDUCTING SILICON COMPOUNDS; THERMOOXIDATION; X RAY PHOTOELECTRON SPECTROSCOPY;

RAPID THERMAL OXIDATION;

THIN FILMS;

EID: 0037074780     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00797-8     Document Type: Conference Paper

References (15)