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Journal of Applied Physics

Volumn 81, Issue 12, 1997, Pages 8018-8028

A diffusional model for the oxidation behavior of Si1-xGex alloys

(3) Kilpatrick, S J a,c Jaccodine, R J a Thompson, P E b

a Lehigh University (United States)

b NAVAL RESEARCH LABORATORY (United States)

c IBM MICROELECTRONICS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000183560 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.365406 Document Type: Article

Times cited : (67)

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