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Volumn 83, Issue 5, 1998, Pages 2842-2846

Kinetics and mechanism of low temperature atomic oxygen-assisted oxidation of SiGe layers

b CNRS (France)

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[No Author keywords available]

Indexed keywords

EID: 0001466633 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.367045 Document Type: Article

Times cited : (30)

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