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Volumn 35, Issue 17, 2002, Pages 2211-2216

Power density in RF PECVD: A factor for deposition of amorphous silicon thin films and successive solid phase crystallization

(2) Das, Chandan a Ray, Swati a

a DEPARTMENT OF MATERIALS SCIENCE (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CRYSTALLINE MATERIALS; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; HYDROGEN BONDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY;

MICROCRYSTALLINE FILMS; POWER DENSITY;

THIN FILMS;

EID: 0037037220 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/35/17/319 Document Type: Article

Times cited : (10)

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