Investigation of strain in microstructures by a novel moiré method

Journal of Microelectromechanical Systems

Volumn 11, Issue 6, 2002, Pages 829-836

  Li, Biao ^a,b   Xie, Huimin ^c   Xu, Bai ^a   Geer, Robert ^a   Castracane, James ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b Center for Manufacturing Engineering   (United States)

^c TSINGHUA UNIVERSITY   (China)

Author keywords

Focused ion beam; Moir ; Nanomachining; Strain

Indexed keywords

DIFFRACTION GRATINGS; MICROMACHINING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; STRAIN;

FOCUSED ION BEAM (FIB) MOIRE METHOD;

MICROELECTROMECHANICAL DEVICES;

EID: 0036902735     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.805044     Document Type: Article

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