Measurements of Young's modulus, Poisson's ratio, and tensile strength of polysilicon

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1997, Pages 424-429

  Sharpe, William N Jr ^a   Yuan, Bin ^a   Vaidyanathan, Ranji ^a   Edwards, Richard L ^a  

^a JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; ETCHING; INTERFEROMETRY; LASER APPLICATIONS; PIEZOELECTRICITY; SEMICONDUCTING SILICON; STRAIN MEASUREMENT; SUBSTRATES; TENSILE STRENGTH; TENSILE TESTING;

LASER INTERFEROMETRY; POISSON'S RATIO; POLYSILICON;

SEMICONDUCTING FILMS;

EID: 0030704418     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.1997.581881     Document Type: Conference Paper

References (19)