High perfection chirped grating phase masks by electron-beam definition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3217-3221

  Rogers, C ^a   Goodchild, D ^a   Baulcomb, R ^a   Butler, M ^b   Hoyle, P ^b   Kanellopoulos, S ^a   Clements, S ^a   Pugh, B ^a  

^a NORTEL NETWORKS   (Canada)

^b Leica Microsystems Lithography Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033260104     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590983     Document Type: Article

References (10)

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